Vapor phase growth apparatus

Details Vapor phase growth apparatus Vapor phase growth apparatus

1996-06-06

1999-02-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

C23C 1600

Patent

active

058688501

ABSTRACT:
A vapor phase growth unit for vapor phase growing on the surface of a wafer under a heated condition, which supports the wafer with a wafer supporter within a reaction chamber and has a heater under the wafer supported by said wafer supporter, wherein a reflection plate for reflecting at least downward heat from said heater is provided, an insulation cylinder is provided surrounding the side periphery of the heater, and the reflection plate consists of vitreous carbon.

REFERENCES:
patent: 5063031 (1991-11-01), Sato

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