Coating apparatus – Gas or vapor deposition
Patent
1998-01-08
2000-10-17
Silverman, Stanley S.
Coating apparatus
Gas or vapor deposition
239423, 239432, 239433, 239434, C23C 1600
Patent
active
061325120
ABSTRACT:
A vapor-phase film growth apparatus includes a substrate holder for holding a substrate, a gas ejection head, and a radiant heat shield device. The substrate holder has a substrate heater therein, and the gas ejection head has a gas injection surface for ejecting a material gas toward a substrate held by the substrate holder. The radiant heat shield device is disposed between the substrate holder and the gas injection head in confronting relationship to the gas injection surface of the gas ejection nozzle. The substantially planar radiant heat shield device is permeable to gases and has a heating capability.
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Abe Masahito
Araki Yuji
Horie Kuniaki
Murakami Takeshi
Nakada Tsutomu
Colaianni Michael P.
Ebara Corporation
Silverman Stanley S.
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