Vapor phase deposition of hydrogen silsesquioxane resin in the p

Details Vapor phase deposition of hydrogen silsesquioxane resin in the p Vapor phase deposition of hydrogen silsesquioxane resin in the p

1992-11-02

1994-05-10

Lusignan, Michael

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

4272553, 4272557, 427578, B05D 306

Patent

active

053105834

ABSTRACT:
Silicon and oxygen containing coatings are deposited by the chemical vapor deposition of hydrogen silsesquioxane in an environment comprising nitrous oxide.

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patent: 5165955 (1992-11-01), Gentle
Desu et al., J. Electrochem. Soc., vol. 139, No. 9, Sep. 1992, Low Temperature CVD of SiO.sub.2 Films Using Novel Precursors.

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