Vapor-phase deposition apparatus and vapor-phase deposition meth

Details Vapor-phase deposition apparatus and vapor-phase deposition meth Vapor-phase deposition apparatus and vapor-phase deposition meth

1994-05-11

1995-12-12

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, C23C 1600

Patent

active

054746124

ABSTRACT:
A vapor-phase deposition apparatus comprises a substrate-supporting unit for supporting a substrate, a heater for heating the substrate-supporting unit, and a gas-supplying unit for supplying gas for forming a thin film on the substrate supported by the substrate-supporting unit. The substrate-supporting unit includes a first member to be heated to a predetermined temperature by the heater, a second member for supporting a peripheral part of the substrate, and a support member for supporting the second member on the first member and located outside a periphery of the substrate.

REFERENCES:
patent: 4535227 (1985-08-01), Shimizu

Affiliated with

Also associated with

Rating

Vapor-phase deposition apparatus and vapor-phase deposition meth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor-phase deposition apparatus and vapor-phase deposition meth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor-phase deposition apparatus and vapor-phase deposition meth will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1357314