Vapor-phase deposition apparatus and vapor-phase deposition meth

Details Vapor-phase deposition apparatus and vapor-phase deposition meth Vapor-phase deposition apparatus and vapor-phase deposition meth

1995-09-21

1996-06-18

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118729, 118730, 118500, C23C 1600

Patent

active

055273939

ABSTRACT:
A vapor-phase deposition apparatus comprises a substrate-supporting unit for supporting a substrate, a heater for heating the substrate-supporting unit, and a gas-supplying unit for supplying gas for forming a thin film on the substrate supported by the substrate-supporting unit. The substrate-supporting unit includes a first member to be heated to a predetermined temperature by the heater, a second member for supporting a peripheral part of the substrate, and a support member for supporting the second member on the first member and located outside a periphery of the substrate.

REFERENCES:
patent: 5169684 (1992-12-01), Takagi

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