Vapor growth method

Details Vapor growth method Vapor growth method

1980-11-07

1982-10-05

Clements, Gregory N.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156614, 156DIG98, 156DIG99, 423344, 427 94, 148175, C30B 2512

Patent

active

043527132

ABSTRACT:
A vapor growth method of forming deposition film on a plurality of substrates disposed within a cylindrical reaction vessel by causing flow of reaction gas under a reduced pressure through the reaction vessel, in which the treated surfaces of substrates are inclined to the upstream side of the reaction gas flow with respect to the axis of the reaction vessel and the individual substrates but the most upstream side one are each shifted in position with respect to the preceding one in a direction perpendicular to the axis of the reaction vessel.

REFERENCES:
patent: 3243323 (1966-03-01), Corrigan et al.
patent: 3409483 (1968-11-01), Watson
patent: 3471326 (1969-10-01), Kappelmeyer et al.
patent: 3553037 (1971-01-01), Bell
patent: 3652331 (1972-03-01), Yamazaki
patent: 3734770 (1973-05-01), Price et al.
patent: 4203799 (1980-05-01), Sugawara et al.

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