Vapor desposition method

Details Vapor desposition method Vapor desposition method

1976-01-27

1977-12-06

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

118 49, 219271, 219275, 427 50, B05D 306

Patent

active

040618005

ABSTRACT:
Method and apparatus for effecting vapor deposition of a material on an object. The material is vaporized in a closed chamber, and the pressure is allowed to build up in the chamber as the material vaporizes. Thereafter, the chamber is opened, and the vapor is applied to the object in a super-heated, high pressure state. If desired, additional materials can be injected into the chamber and added to the vapor before the chamber is opened.

REFERENCES:
patent: 2440135 (1948-04-01), Alexander
patent: 2584660 (1952-02-01), Bancroft
patent: 2910039 (1959-10-01), Patton et al.
patent: 3281517 (1966-10-01), Hemmer et al.
patent: 3446936 (1969-05-01), Hanson et al.
patent: 3574650 (1971-04-01), House
patent: 3690933 (1972-09-01), Cole
patent: 5598384 (1971-08-01), Zucchinelli

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