Vapor deposition system

Details Vapor deposition system Vapor deposition system

1990-03-01

1992-02-18

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118725, C23C 1600

Patent

active

050884441

ABSTRACT:
A vapor deposition system deposits a semiconductor film on a substrate. The system comprises a susceptor on which the substrate is positioned, and a reactor tube in which the susceptor having the substrate is positioned and the semiconductor film is deposited on the substrate. The reactor tube is composed of two parts to be fitted to and separated from each other. An airtight vessel airtightly covers the reactor tube. The system further comprises a mover for moving at least one of the two parts of the reactor tube relative to the other part, thereby fitting and separating the two parts to and from each other. A carrying device is provided for the system to carry the susceptor having the substrate from the airtight vessel into the reactor tube through an opening to be opened by separating the two parts of the reactor tube from each other, and to carry the susceptor from the reactor tube to the airtight vessel through the opening.

REFERENCES:
patent: 4268538 (1981-05-01), Toole
patent: 4709655 (1987-12-01), Van Mastrigt
patent: 4883020 (1989-11-01), Kasai

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