Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Reexamination Certificate
2011-03-29
2011-03-29
Chen, Keath T (Department: 1712)
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
Reexamination Certificate
active
07914621
ABSTRACT:
A vapor deposition source has a reduced size by disposing a crucible, a heating portion, and a nozzle portion in one defined space. A vapor deposition apparatus deposits deposition materials on a substrate using the vapor deposition source. The vapor deposition source includes a housing, and the crucible is mounted in the housing for vaporizing the deposition materials. The heating portion is installed adjacent to the crucible in the housing for heating the crucible. The nozzle portion injects the vaporized deposition materials into a substrate disposed at an exterior of the housing through an injection nozzle. The vapor deposition source is manufactured in a smaller and lightweight form in comparison with conventional vapor deposition sources in which a crucible and a nozzle portion are arranged in different spaces. The diameter and number of injection nozzles of the invention are restricted to block radiant heat discharged from the vapor deposition source, so that deposition materials are uniformly deposited. Furthermore, the output power of a conveyer for conveying the vapor deposition source is reduced. In addition, a plurality of vapor deposition sources is arranged in a line to perform concentrated deposition of deposition materials so that quality of the resultant product is improved.
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Furuno Kazuo
Huh Myung Soo
Jeong Seok Heon
Kang Hee Cheol
Kim Do Geun
Bushnell , Esq. Robert E.
Chen Keath T
Samsung Mobile Display Co., Ltd.
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