Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-02-16
1999-07-20
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
427488, 528220, 528396, 430296, G03F 7075, G03F 7004
Patent
active
059254947
ABSTRACT:
The invention provides a method for vapor-depositing a polymer film having constituents that are synthesized during the deposition and that can therefore be customized by time-dependent process control during the deposition. In the vapor-deposition process, a hydrocarbon precursor is reacted with an oxygen-containing precursor in a plasma environment. The plasma reaction synthesizes O--H bonds and forms a polymer having O--H bonds, C--C bonds, and C--H.sub.x bonds. Preferably, the hydrocarbon and oxygen-containing precursors are employed in a ratio selected such that the resulting polymer film has a selected level of oxygen constituency providing a corresponding selected ratio of O--H bond concentration to C--H.sub.x bond concentration. The precursor ratio is preferably varied as a function of time during the plasma reaction to result in a corresponding distribution, e.g., a depth-dependent distribution, of O--H bonds in the film. The vapor-deposited polymer film provided by the invention is particularly well-suited as an all-dry positive-tone silylation photoresist because the vapor-deposition process can custom-synthesize a constituent hydroxyl group concentration and distribution in the photoresist film for a given photolithographic application.
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Hamilton Cynthia
Lober Theresa A.
Massachusetts Institute of Technology
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