Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

1992-05-29

1993-04-27

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

427582, C23C 1648

Patent

active

052058700

ABSTRACT:
An argon (Ar.sup.+) laser has a resonator. A reaction chamber is integrally formed in the resonator. A voltage is applied to electrodes, which discharge electricity to excite argon atoms in the resonator to produce a laser beam. The laser beam is continuously oscillated between total reflection mirrors disposed at opposite ends of the resonator. A substrate is disposed in the reaction chamber into which a material gas is introduced. The material gas absorbs the laser beam, to decompose and deposit as a thin film over the substrate.

REFERENCES:
patent: 4500565 (1985-02-01), Hiramoto
patent: 4525382 (1985-06-01), Sugioka
patent: 4664057 (1987-05-01), Hemmati
Chemical Physics Letters, vol. 130, No. 4, pp. 321-329, Elsevier Science Publishers, Oct. 10, 1986 J. J. O'Brien, et al.; "Detection of the SiH.sub.2 Radical by Intracavity Laser Absorption Spectroscopy".

Affiliated with

Also associated with

Rating

Vapor deposition apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapor deposition apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor deposition apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2324236