Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

1991-01-09

1992-09-29

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118730, C23C 1600

Patent

active

051511339

ABSTRACT:
A vapor deposition apparatus for forming thin films on substrates with reactive gases, by rotating and revolving the substrates while heating the substrates in a reactor vessel, comprises a hollow susceptor carrier rotatably disposed inside the reactor vessel, susceptors rotatably disposed on the susceptor carrier to hold the substrates respectively, a driving motor for rotating the susceptor carrier such that the substrates held by the susceptors are revolved with respect to the reactor vessel, and a converting mechanism for converting a rotation motion of the susceptor carrier rotated by the driving motor into a motion for rotating the susceptors together with the substrates around themselves. The converting mechanism is disposed within the hollow of the susceptor carrier.

REFERENCES:
patent: 3594227 (1971-07-01), Oswald
patent: 4108107 (1978-08-01), Scheuermann
patent: 4596208 (1986-06-01), Wolfson
patent: 5002011 (1991-03-01), Ohmine

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