Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-07-05
2005-07-05
Ngô, Ngân V. (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S674000, C438S678000, C438S679000
Reexamination Certificate
active
06913998
ABSTRACT:
Metallic films are grown with a “spongelike” morphology in the as-deposited condition using planar magnetron sputtering. The morphology of the deposit is characterized by metallic continuity in three dimensions with continuous and open porosity on the submicron scale. The stabilization of the spongelike morphology is found over a limited range of the sputter deposition parameters, that is, of working gas pressure and substrate temperature. This spongelike morphology is an extension of the features as generally represented in the classic zone models of growth for physical vapor deposits. Nickel coatings were deposited with working gas pressures up 4 Pa and for substrate temperatures up to 1000 K. The morphology of the deposits is examined in plan and in cross section views with scanning electron microscopy (SEM). The parametric range of gas pressure and substrate temperature (relative to absolute melt point) under which the spongelike metal deposits are produced appear universal for other metals including gold, silver, and aluminum.
REFERENCES:
patent: 5204191 (1993-04-01), Dubois et al.
patent: 6365236 (2002-04-01), Maloney
patent: 6541676 (2003-04-01), Franz et al.
patent: 6569553 (2003-05-01), Koripella et al.
patent: 2002/0081468 (2002-06-01), Shioya
patent: 2002/0094462 (2002-07-01), Shioya et al.
patent: 2002/0106540 (2002-08-01), Shioya
patent: 2003/0190508 (2003-10-01), Takeyama et al.
Aleks J. Franz et al, High Temperature Gas Phase Catalytic and Membrane Reactors.
Francis Jones et al, Experimental System for the Study of Gas-Solid Heterogeneous Catalysis in Microreactors, Microfluidic Devices and Systems III Proceedings of SPIE vol. 4177 pp. 124-131.
Tamara M. Floyd et al, Liquid-Phase and Multi-Phase Microreactors for Chemical Synthesis.
Ravi Srinivasan et al, Micromachined Reactors for Catalytic partial Oxidation Reactions, AIChE Journal Nov. 1997 vol. 43 No. 11 pp. 3059-3068.
T. Tsai et al, Sputter deposition of cermet fuel electrodes for solid oxide fuel cells, J. Vac. Sci, Technol. A 13 (3) May/Jun. 1995.
Hayes Jeffrey P.
Jankowski Alan F.
Morse Jeffrey D.
Ngo Ngan V.
Scott Eddie E.
Tak James S.
The Regents of the University of California
Thompson Alan H.
LandOfFree
Vapor-deposited porous films for energy conversion does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor-deposited porous films for energy conversion, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor-deposited porous films for energy conversion will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3375252