Valve cleaning method

Details Valve cleaning method Valve cleaning method

1998-10-14

2000-11-21

Carrillo, Sharidan

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

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Patent

active

061497312

ABSTRACT:
A valve cleaning apparatus and method provide for cleaning of heat resistant, scratch resistant coated valves using deionized water and at least one chemical mixture. The cleaning method includes sampling and analysis of the chemical mixture for the presence of metal impurities to within 0.5 to 1.5 ppb. Valves cleaned using this method and apparatus can then be transferred for use in semiconductor device fabrication equipment without the danger of metal impurities from the valves entering and damaging the fabrication equipment and the semiconductor devices being fabricated. The apparatus uses a single pumping device and a single return line, which are provided with selection devices to alternatively supply to or return from the valves either the deionized water or the chemical mixture. A plurality of same-sized or different-sized valves can be cleaned simultaneously.

REFERENCES:
patent: 4552167 (1985-11-01), Brakelmann
patent: 5360488 (1994-11-01), Hieatt et al.
patent: 5904173 (1999-05-01), Ozawa
patent: 5964230 (1999-10-01), Voloshin et al.
patent: 6045698 (2000-04-01), Cote et al.

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