Vacuum treatment system for homogeneous workpiece processing

Details Vacuum treatment system for homogeneous workpiece processing Vacuum treatment system for homogeneous workpiece processing

1995-07-10

1998-05-19

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723DC, 118723FE, 118729, 156345, 31511121, C23C 1600, C23F 102

Patent

active

057530459

ABSTRACT:
A process provides for the reactive treatment of workpieces in which a plasma beam is produced in an evacuated recipient. With respect to the area of the highest plasma density along the beam axis, workpieces are arranged in a radially offset manner. Fresh reactive gas is charged into the recipient and used-up gas is sucked out of the recipient. A vacuum treatment system comprises a plasma beam production arrangement, a gas inlet operatively connected with a reactive gas supply, an axially extending workpiece carrier arrangement radially set off from an axis of a plasma beam produced by the plasma beam production arrangement. The workpiece carrier arrangement mounts a rotational surface coaxial with respect to the axis of the plasma beam and a gas suction system. The process and system are used to deposit metastable layers, including cBN-layers, .alpha.-Al.sub.2 O.sub.3 layers, C.sub.3 N.sub.4 layers, and diamond layers, on the workpieces, to surface treat with reactive chemical compounds, including free radicals, and to coat.

REFERENCES:
patent: 4421592 (1983-12-01), Shuskus
patent: 4509451 (1985-04-01), Collins
patent: 4612207 (1986-09-01), Jansen
patent: 4643952 (1987-02-01), Kurakata
patent: 4762756 (1988-08-01), Bergmann
patent: 4782267 (1988-11-01), Collins
patent: 4840139 (1989-06-01), Takei
patent: 4893584 (1990-01-01), Doehler
patent: 4930442 (1990-06-01), Iida et al.
patent: 4953498 (1990-09-01), Hasizume
patent: 4969416 (1990-11-01), Schumaker et al.
patent: 4998968 (1991-03-01), Misumi
patent: 5095247 (1992-03-01), Hanamura
patent: 5227202 (1993-07-01), Thiebaud et al.
patent: 5256206 (1993-10-01), Anthony et al.
patent: 5336326 (1994-08-01), Karner
patent: 5342660 (1994-08-01), Cann et al.
patent: 5356672 (1994-10-01), Schmitt, III et al.
patent: 5413663 (1995-05-01), Shimizu
patent: 5435849 (1995-07-01), Cann
patent: 5490910 (1996-02-01), Nelson
Surface & Coatings Technology, Fourth International Conference on Plasma Surface Engineering, Sep. 9-23, 1994 3 pages.
Influence Of Plasma Parameters On The Properties Of Diamond Films Deposited By The D.C. Arc Technique; V. Bohm et al., Jan. 27, 1994; 10 pages.
Radio Frequency Plasma Jet Applied To Coating Of Internal Walls Of Narrow Tubes, L. Bardos, S. Berg and H. Barankova, Journal Of Vacuum Science & Technology, Jul./Aug. 1993, No. 4, Part I, three pages.

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