Vacuum treatment system for applying thin layers to substrates s

Details Vacuum treatment system for applying thin layers to substrates s Vacuum treatment system for applying thin layers to substrates s

1997-07-01

1998-12-15

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118733, 20429825, 204729, 204730, C23C 1400

Patent

active

058490876

ABSTRACT:
In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations (20) supported on a stationary vacuum chamber wall (16, 16', . . . ) and with a rotatably supported internal cylinder (14), which is enclosed by the vacuum chamber wall and carries the substrate chambers (3-6), openings (24-27) are provided in the vacuum chamber wall (16, 16', . . . ), with which the substrate chambers (3-6) can be aligned and through which the treatment agents can be allowed to act on the substrates (2, 2', . . . ) and/or through which the substrates can be transferred in and out, where one of the substrate chambers, but at least the inward/outward transfer lock chamber (20), has as cover or a sealing flap (33), which allows direct access to the corresponding substrate chamber, and where the chamber (20) can be shifted (A, B) toward the internal cylinder (14) and pressed against the outside wall of the cylinder (14) or against the frame-like end surface of the substrate chamber (3).

REFERENCES:
patent: 3915117 (1975-10-01), Schertler
patent: 5415729 (1995-05-01), Strasser

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