Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-09-12
2006-09-12
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S008000, C427S009000, C427S010000, C216S059000, C216S060000, C216S061000
Reexamination Certificate
active
07105080
ABSTRACT:
Method for manufacturing a workpiece by a vacuum treatment process includes providing a vacuum treatment system with first second parts in a vacuum chamber. Either a sensor or an adjusting element with first signal connection is mounted on the second part. An electronic unit in the chamber has a reference potential and a second electric signal connection. The first part is connected to a system reference potential. A workpiece goes into the chamber and the method includes operating the second part at a further electric potential different from the system reference potential by at least 12 V. The method includes connecting the first electric signal connection to the second electric signal connection and maintaining the reference connection during operation on the further electric potential by metallically connecting the reference connection to the second part.
REFERENCES:
patent: 4409087 (1983-10-01), Quick
patent: 4579639 (1986-04-01), Enomoto et al.
patent: 4913790 (1990-04-01), Narita et al.
patent: 5292417 (1994-03-01), Kugler
McDonald Rodney G.
Notaro & Michalos P.C.
OC Oerlikon Balzers AG
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