Vacuum treatment chamber

Details Vacuum treatment chamber Vacuum treatment chamber

1996-02-08

1998-03-31

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419222, 20419223, 20429806, 20429808, 20429814, C23C 1434, C23C 1435

Patent

active

057334196

ABSTRACT:
A vacuum treatment chamber has a sputtering electrode and a counter electrode together defining a plasma discharge area. The counter electrode has an electrode surface area which is not visible from the sputtering electrode. A third electrode, together with the non-visible surface area, defines an auxiliary plasma discharge space. A substantially unencumbered propagative electron path is established between the discharge spaces. A plasma discharge is generated between the sputtering electrode and the counter electrode within a vacuum chamber.

REFERENCES:
patent: 3514391 (1970-05-01), Hablanian
patent: 4619755 (1986-10-01), Hessberger et al.
patent: 5106474 (1992-04-01), Dickey et al.
patent: 5403458 (1995-04-01), Hartig et al.

Affiliated with

Also associated with

Rating

Vacuum treatment chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum treatment chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum treatment chamber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-48005