Vacuum treatment apparatus and vacuum treatment method

Details Vacuum treatment apparatus and vacuum treatment method Vacuum treatment apparatus and vacuum treatment method

1990-02-27

1991-10-29

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429826, 118730, C23C 1400

Patent

active

050613561

ABSTRACT:
A vacuum treatment apparatus includes a vacuum chamber having a first treatment position and at least one second treatment position where a substrate supported on a substrate stage subjected to a vacuum treatment. A drive device is operatively connected to a holding device to drive the same so that the holding device can move the substrate stage between the first and second treatment positions. The drive device is also operable to drive the holding device so that the holding device can rotate the substrate stage about the axis thereof at the first treatment position. A rotating device is provided for rotating the substrate stage about the axis thereof when the substrate stage is disposed at the second treatment position.

REFERENCES:
patent: 3785853 (1974-01-01), Kirkman et al.
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4583488 (1986-04-01), Brown et al.

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