Vacuum treatment apparatus

Details Vacuum treatment apparatus Vacuum treatment apparatus

1999-05-19

2000-11-21

McDonald, Rodney

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429803, 20429805, 20429806, 20429841, 156345, 118723E, 118723VE, C23C 1454, C23C 1434, C23C 1432

Patent

active

061497835

ABSTRACT:
A vacuum treatment apparatus (FIG. 13) includes a vacuum recipient or chamber (3) for containing an atmosphere. A mechanism (50,52) for generating electrical charge carriers in the atmosphere is provided in the recipient, the electrical charge carriers being of the type that form electrically isolating material. The recipient also contains a work piece carrier arrangement (1) and at least two electroconductive surfaces (2a, 2b) which are mutually electrically isolated from each other. A DC power supply (8) is operationally connected to the electroconductive surfaces by respective electrical conductors with an inductor (L.sub.66) in one of the conductors. A parallel switching arrangement is connected between the electrical conductors to control a current path between the conductors.

REFERENCES:
patent: 5192894 (1993-03-01), Teschner
patent: 5241152 (1993-08-01), Anderson et al.
patent: 5300205 (1994-04-01), Fritsche
patent: 5427669 (1995-06-01), Drummond
patent: 5718813 (1998-02-01), Drummond et al.
patent: 5948224 (1999-09-01), Signer et al.

Affiliated with

Also associated with

Rating

Vacuum treatment apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum treatment apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum treatment apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1253650