Pumps – With condition responsive pumped fluid control – Plural paths having individual condition responsive control...
Patent
1996-09-04
1999-01-12
Thorpe, Timothy
Pumps
With condition responsive pumped fluid control
Plural paths having individual condition responsive control...
417313, 34 92, 34406, 55484, F04B 3916, F04B 4900
Patent
active
058578404
ABSTRACT:
The objects of the present invention are to remove the dust in a closed container, to keep the pressure in the closed container within a predetermined range, and to shorten the maintenance time of a vacuum pump system.
The present invention provides a centrifugal dust collector 2 on main pipes which connects a furnace body 1, a mechanical press 9 and a dry pump 10, and a metal mesh dust collector 15 on a bifurcated pipe in a single-crystal semiconductor pulling apparatus. When the vacuum pump process begins, the metal mesh dust collector 15 collects amorphous silicon generated in the furnace 1. As the pressure in the furnace is reduced, the centrifugal dust collector 2 collects the dust particles instead. Since the gas flow rate increases as the vacuum state become higher, the critical diameter of collectable particles decreases, thereby improving the dust collection efficiency. The collected amorphous silicon accumulates on the bottom of the centrifugal dust collector and can be easily removed so as to facilitate maintenance. Moreover, there will be very little pressure variance in the furnace since no dust filter is blocked.
REFERENCES:
patent: 5019257 (1991-05-01), Suzuki et al.
patent: 5062771 (1991-11-01), Satou et al.
patent: 5069691 (1991-12-01), Travis et al.
patent: 5129124 (1992-07-01), Gamou et al.
patent: 5137554 (1992-08-01), Carter, Jr.
patent: 5223001 (1993-06-01), Saeki
patent: 5272866 (1993-12-01), Niemen
Hiraishi Yoshinobu
Suda Ayumi
Gartenberg Ehud
Komatsu Electronic Metals Co. Ltd.
Thorpe Timothy
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