Vacuum processing method and apparatus

Details Vacuum processing method and apparatus Vacuum processing method and apparatus

1987-10-27

1990-02-20

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

4272481, 4272555, 427294, 427307, 427314, 427444, B05D 306

Patent

active

049025317

ABSTRACT:
A vacuum processing method and apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber can be mechanically and easily controlled by adjusting the position of a susceptor in respect to an electrode body, and the susceptor and other components in the vacuum chamber can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber.

REFERENCES:
patent: 4446168 (1984-05-01), Kato et al.
patent: 4524089 (1985-06-01), Haque et al.

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