Vacuum processing equipment, film coating equipment and depositi

Details Vacuum processing equipment, film coating equipment and depositi Vacuum processing equipment, film coating equipment and depositi

1995-06-06

1998-01-13

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

156345, 20429809, 20429825, 20429832, 20429835, 118719, 118724, 118725, 118729, 118666, 118667, 118688, C23C 1454, C23C 1600, C23F 102

Patent

active

057075000

ABSTRACT:
The present invention relates to vacuum processing equipment for processing a wafer in a vacuum, and film coating or forming equipment and method for forming a film on a wafer wherein radiation measurement and temperature control of the wafer is carried out by using an infrared radiation thermometer. Based upon the radiation measurement, heating and/or cooling of the wafer during processing is carried out.

REFERENCES:
patent: 4913790 (1990-04-01), Narita et al.
patent: 4984902 (1991-01-01), Crowley et al.
patent: 5147498 (1992-09-01), Nashimoto

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