Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...
Patent
1994-04-13
1996-04-30
Bueker, Richard
Coating processes
Coating by vapor, gas, or smoke
Base includes an inorganic compound containing silicon or...
4272557, 4272555, 118719, 118725, 118729, 432 5, 432 18, 432 86, C23C 1600
Patent
active
055123201
ABSTRACT:
A method for depositing sequential thin films on glass substrates by single substrate deposition comprising loading a batch of substrates into a load lock chamber and evacuating the chamber, transferring the substrates to a batch heating chamber for heating the substrates to elevated temperatures; transferring the glass substrates singly to one or more single substrate processing chambers, and sequentially transferring the substrates back to the load lock chamber where they are batch cooled.
A vacuum system for carrying out the method includes a load lock/cooling chamber for evacuating a plurality of glass substrates; a heating chamber for heating a plurality of substrates to elevated temperatures; one or more single substrate processing chambers; and a transfer chamber having access to all of said chambers and having automated means therein for transferring the glass substrates into and out of said chambers in a preselected order.
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Joint Development Agreement Between Applied Materials, Inc. (Applicant's Assignee) and two unrelated companies (Companies A & B), dated May 29, 1991 (Exhibit A hereto).
Turner Norman L.
White John M.
Applied Materials Inc.
Bueker Richard
Edelman Lawrence
Morris Birgit E.
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