Vacuum processing apparatus and vacuum processing method of...

Etching a substrate: processes – Gas phase etching of substrate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C216S067000, C438S706000, C257SE21252, C257SE21257, C257SE21577, C257SE21579

Reexamination Certificate

active

07947189

ABSTRACT:
A vacuum processing method includes mounting a sample to be processed on a sample mounting surface on a sample holder placed in a vacuum container whose inside can be depressurized, feeding a processing gas and electric field to a space above the sample holder inside of the vacuum container to generate plasma, and etching films of a plurality of layers laid over the surface of the sample into a predetermined shape. A heat conducting gas is fed between the sample mounting surface and the backside of the sample, and at the same time, the pressure of the heat conducting gas is changed stepwise in accordance with the progress of the processing of the films of a plurality of layers of the sample.

REFERENCES:
patent: 5660047 (1997-08-01), Paganessi
patent: 5673750 (1997-10-01), Tsubone et al.
patent: 5810933 (1998-09-01), Mountsier et al.
patent: 5835334 (1998-11-01), McMillin et al.
patent: 5968847 (1999-10-01), Ye et al.
patent: 6500681 (2002-12-01), Christian et al.
patent: 6534416 (2003-03-01), Ye et al.
patent: 6547559 (2003-04-01), Hodos
patent: 6946387 (2005-09-01), Wada et al.
patent: 7179663 (2007-02-01), Chang
patent: 7402517 (2008-07-01), Yonker et al.
patent: 7667301 (2010-02-01), Nakamura et al.
patent: 2002/0067585 (2002-06-01), Fujiwara
patent: 2002/0192938 (2002-12-01), Wada et al.
patent: 2004/0196616 (2004-10-01), Koo et al.
patent: 2004/0247787 (2004-12-01), Mackie et al.
patent: 2005/0284571 (2005-12-01), Negishi et al.
patent: 2006/0223312 (2006-10-01), Yonker et al.
patent: 2007/0009649 (2007-01-01), Nakamura et al.
patent: 2008/0170969 (2008-07-01), Yoshioka et al.
patent: 2008/0245304 (2008-10-01), Yonker et al.
patent: 2009/0000741 (2009-01-01), Aramaki et al.
patent: 2009/0181545 (2009-07-01), Negishi et al.
patent: 2010/0055879 (2010-03-01), Harano et al.
patent: 63-274147 (1988-11-01), None
patent: 07-249586 (1995-09-01), None
patent: 09-097786 (1997-04-01), None
patent: 11-097516 (1999-04-01), None
patent: 2003-100718 (2003-04-01), None
patent: 2003-234326 (2003-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum processing apparatus and vacuum processing method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum processing apparatus and vacuum processing method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum processing apparatus and vacuum processing method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2666211

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.