Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2011-03-29
2011-03-29
Barr, Michael (Department: 1711)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230MW, C256S013000
Reexamination Certificate
active
07913646
ABSTRACT:
The invention provides a vacuum processing apparatus having a function for removing particles on the surface of the sample stage in order to improve the yield of the sample being processed. The vacuum processing apparatus comprises a processing chamber104disposed in a vacuum reactor and having plasma formed in the interior thereof, a sample stage113placed below the processing chamber104and having a sample102to be processed placed on the upper plane thereof for processing, and a gas introducing mechanism placed at an upper portion of the processing chamber104and having introduction holes for introducing processing gas into the processing chamber, wherein the sample stage113comprises grooves117and a gas supply port119for introducing thermal conductance gas118between the sample stage and the sample102to be processed, and a mechanism for introducing dust removal gas120through the gas supply port119between the sample stage113and the sample102to be processed or a dummy sample202having substantially the same shape as the sample to be processed placed on the sample stage113within the vacuum reactor, by which particles201attached to the sample stage113are removed via hydrodynamic force by the dust removal gas120.
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Kitaoka Ken
Sakaguchi Masamichi
Takahasi Kazue
Antonelli, Terry Stout & Kraus, LLP.
Barr Michael
Chaudhry Saeed T
Hitachi High-Technologies Corporation
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