Vacuum processing apparatus and semiconductor manufacturing line

Details Vacuum processing apparatus and semiconductor manufacturing line Vacuum processing apparatus and semiconductor manufacturing line

1996-07-08

1999-01-05

Breneman, Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118719, 20429825, 20429835, 414935, 414937, 414939, 414940, C23C 1600

Patent

active

058557261

ABSTRACT:
A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing on the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed to be larger than the width of the vacuum processing block, and the overall plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

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IBM Technical Disclosure Bulletin, vol. 27, No. 12, 31 May 1985, pp. 6997-6998 XP002017023 "Generic work station".

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