Vacuum processing apparatus and operating method therefor

Drying and gas or vapor contact with solids – Apparatus – Vacuum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C034S060000, C134S085000, C134S902000, C414S939000, C414S940000

Reexamination Certificate

active

07089680

ABSTRACT:
A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.

REFERENCES:
patent: 3652444 (1972-03-01), Lester et al.
patent: 3981791 (1976-09-01), Rosvold
patent: 4138306 (1979-02-01), Niwa
patent: 4226897 (1980-10-01), Coleman
patent: 4311427 (1982-01-01), Coad et al.
patent: 4313783 (1982-02-01), Davies et al.
patent: 4313815 (1982-02-01), Graves, Jr. et al.
patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4457661 (1984-07-01), Flint et al.
patent: 4534314 (1985-08-01), Ackley
patent: 4563240 (1986-01-01), Shibata et al.
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4634331 (1987-01-01), Hertel
patent: 4643629 (1987-02-01), Takahashi et al.
patent: 4705951 (1987-11-01), Layman et al.
patent: 4715764 (1987-12-01), Hutchinson
patent: 4824309 (1989-04-01), Kakehi et al.
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4836905 (1989-06-01), Davis et al.
patent: 4851101 (1989-07-01), Hutchinson
patent: 4895107 (1990-01-01), Yano et al.
patent: 4902934 (1990-02-01), Miyamura et al.
patent: 4903937 (1990-02-01), Jakubiec et al.
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 4911597 (1990-03-01), Maydan et al.
patent: 4915564 (1990-04-01), Eror et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.
patent: 4924890 (1990-05-01), Giles et al.
patent: 4936329 (1990-06-01), Michael et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 4969790 (1990-11-01), Petz et al.
patent: 5007981 (1991-04-01), Kawasaki et al.
patent: 5014217 (1991-05-01), Savage
patent: 5248886 (1993-09-01), Asakawa et al.
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5436848 (1995-07-01), Nishida et al.
patent: 5452166 (1995-09-01), Aylwin et al.
patent: 5462397 (1995-10-01), Iwabuchi
patent: 5504033 (1996-04-01), Bajor et al.
patent: 5504347 (1996-04-01), Jovanovic et al.
patent: 5509771 (1996-04-01), Hiroki
patent: 5536128 (1996-07-01), Shimoyashiro et al.
patent: 5556714 (1996-09-01), Fukuyama et al.
patent: 5651858 (1997-07-01), Lin
patent: 5675461 (1997-10-01), Aylwin et al.
patent: 5685684 (1997-11-01), Kato et al.
patent: 6235634 (2001-05-01), White et al.
patent: 20246453 (1987-04-01), None
patent: 20381338 (1990-05-01), None
patent: 5729577 (1982-02-01), None
patent: 60246635 (1985-12-01), None
patent: SHO-61-173445 (1986-08-01), None
patent: 6244571 (1987-02-01), None
patent: 6250463 (1987-03-01), None
patent: 6289881 (1987-04-01), None
patent: 62-216315 (1987-09-01), None
patent: 62207866 (1987-09-01), None
patent: 63-133521 (1988-06-01), None
patent: 63153270 (1988-06-01), None
patent: 636582 (1989-01-01), None
patent: 6412037 (1989-01-01), None
patent: 64-038042 (1989-02-01), None
patent: 131970 (1989-02-01), None
patent: 131971 (1989-02-01), None
patent: 1135015 (1989-05-01), None
patent: 1251734 (1989-10-01), None
patent: 1298180 (1989-12-01), None
patent: 1310553 (1989-12-01), None
patent: 02-065252 (1990-03-01), None
patent: 261064 (1990-03-01), None
patent: 265252 (1990-03-01), None
patent: 294647 (1990-04-01), None
patent: 2106037 (1990-04-01), None
patent: 02-178946 (1990-07-01), None
patent: 430549 (1992-04-01), None
patent: 63-153270 (1998-06-01), None
patent: 8707309 (1987-05-01), None
R.P.H. Chang, “Multipurpose plasma reactor for materials research and processing”, J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 278-280.
Semiconductor Equipment Association of Japan, “Terminological Dictionary of Semiconductor Equipment”, front, table, p. 183, back, Nov. 20, 1987.
Semiconductor Equipment Association of Japan, “Semiconductor News”, vol. 4, pp. 38-43, Apr. 10, 1987 (w/ translation).
Decision on Opposition No. 2001.72514 relating to JP 3145359, Patentee Hitachi, Ltd., pp. 1-27, Nov. 20, 2002.
Decision on Opposition No. 2001.72518 relating to JP 3145375, Patentee Hitachi, Ltd., pp. 1-28, Nov. 20, 2002.
Decision on Opposition No. 2001.72519 relating to JP 3145376, Patentee Hitachi, Ltd., pp. 1-23, Nov. 20, 2002.
Decision on Opposition No. 2001.72574 relating to JP 3147230, Patentee Hitachi, Ltd., pp. 1-22, Nov. 20, 2002.
S. Nakagawa, “Dry Etching”, Drafts in Symposium of VLSI and FA Technology, Apr. 1985, pp. 1-14.
N. Nagsi, “Parallel-Implantation Ion Implantation Device NH-20SP”, Special Issue/Semiconductor Manufacturing Device of Half-Micron Age, pp. 1-12, Mar. 1990.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum processing apparatus and operating method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum processing apparatus and operating method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum processing apparatus and operating method therefor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3698809

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.