Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate
2005-11-29
2005-11-29
Bennett, Henry (Department: 3749)
Drying and gas or vapor contact with solids
Process
Gas or vapor pressure is subatmospheric
C034S092000, C034S218000, C134S902000
Reexamination Certificate
active
06968630
ABSTRACT:
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
REFERENCES:
patent: 3652444 (1972-03-01), Lester et al.
patent: 3981791 (1976-09-01), Rosvold
patent: 4138306 (1979-02-01), Niwa
patent: 4226897 (1980-10-01), Coleman
patent: 4311427 (1982-01-01), Coad et al.
patent: 4313783 (1982-02-01), Davies et al.
patent: 4313815 (1982-02-01), Graves, Jr. et al.
patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4338883 (1982-07-01), Mahler
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4457661 (1984-07-01), Flint et al.
patent: 4534314 (1985-08-01), Ackley
patent: 4563240 (1986-01-01), Shibata et al.
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4634331 (1987-01-01), Hertel
patent: 4643629 (1987-02-01), Takahashi et al.
patent: 4670126 (1987-06-01), Messer et al.
patent: 4705951 (1987-11-01), Layman et al.
patent: 4715764 (1987-12-01), Hutchinson
patent: 4824309 (1989-04-01), Kakehi et al.
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4836905 (1989-06-01), Davis et al.
patent: 4851101 (1989-07-01), Hutchinson
patent: 4857160 (1989-08-01), Landau et al.
patent: 4895107 (1990-01-01), Yano et al.
patent: 4902934 (1990-02-01), Miyamura et al.
patent: 4903937 (1990-02-01), Jakubiec et al.
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 4911597 (1990-03-01), Maydan et al.
patent: 4915564 (1990-04-01), Eror et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.
patent: 4924890 (1990-05-01), Giles et al.
patent: 4936329 (1990-06-01), Michael et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 4969790 (1990-11-01), Petz et al.
patent: 5007981 (1991-04-01), Kawasaki et al.
patent: 5014217 (1991-05-01), Savage
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5436848 (1995-07-01), Nishida et al.
patent: 5452166 (1995-09-01), Aylwin et al.
patent: 5462397 (1995-10-01), Iwabuchi
patent: 5504033 (1996-04-01), Bajor et al.
patent: 5504347 (1996-04-01), Jovanovic et al.
patent: 5509771 (1996-04-01), Hiroki
patent: 5536128 (1996-07-01), Shimoyashiro et al.
patent: 5556714 (1996-09-01), Fukuyama et al.
patent: 5651858 (1997-07-01), Lin
patent: 5675461 (1997-10-01), Aylwin et al.
patent: 5685684 (1997-11-01), Kato et al.
patent: 20246458 (1987-04-01), None
patent: 20381338 (1990-05-01), None
patent: 5729577 (1982-02-01), None
patent: 58-93321 (1983-06-01), None
patent: 58-95636 (1983-06-01), None
patent: 58-108641 (1983-06-01), None
patent: 59-094435 (1984-05-01), None
patent: 60-52574 (1985-03-01), None
patent: 60246635 (1985-12-01), None
patent: 61-173445 (1986-08-01), None
patent: 61-250185 (1986-11-01), None
patent: 6244571 (1987-02-01), None
patent: 6250463 (1987-03-01), None
patent: 6289881 (1987-04-01), None
patent: 62-132321 (1987-06-01), None
patent: 62207866 (1987-09-01), None
patent: 62-216315 (1987-09-01), None
patent: 63-57734 (1988-04-01), None
patent: 63-133521 (1988-06-01), None
patent: 63153270 (1988-06-01), None
patent: 63-131123 (1988-08-01), None
patent: 636582 (1989-01-01), None
patent: 6412037 (1989-01-01), None
patent: 64-500072 (1989-01-01), None
patent: 131970 (1989-02-01), None
patent: 131971 (1989-02-01), None
patent: 64-036042 (1989-02-01), None
patent: 1-120811 (1989-05-01), None
patent: 1135015 (1989-05-01), None
patent: 1-170013 (1989-06-01), None
patent: 1251734 (1989-10-01), None
patent: 1298180 (1989-12-01), None
patent: 1310553 (1989-12-01), None
patent: 1-316957 (1989-12-01), None
patent: 2-52449 (1990-02-01), None
patent: 261064 (1990-03-01), None
patent: 265252 (1990-03-01), None
patent: 02-065252 (1990-03-01), None
patent: 294647 (1990-04-01), None
patent: 2106037 (1990-04-01), None
patent: 2-178946 (1990-07-01), None
patent: 02-178946 (1990-07-01), None
patent: 2-224242 (1990-09-01), None
patent: 3-19252 (1991-01-01), None
patent: 430549 (1992-04-01), None
patent: 4-82841 (1992-07-01), None
patent: 63-153270 (1998-06-01), None
patent: 8707309 (1987-05-01), None
S. Nakagawa, “Dry Etching”, Drafts in Symposium of VLSI and FA Technology, Apr. 1985, pp. 1-14.
N. Nagai, “Parallel-Implantation Ion Implantation Device “NH-20SP””, Special Issue/Semiconductor Manufacturing Device of Half-Micron Age, pp. 1-12, Mar. 1990.
Decision on Opposition No. 2001.72514 relating to JP 3145359, Patentee Hitachi, Ltd., pp. 1-27. Nov. 20, 2002.
Decision on Opposition No. 2001.72518 relating to JP 3145375, Patentee Hitachi, Ltd., pp. 1-28. Nov. 20, 2002.
Decision on Opposition No. 2001.72519 relating to JP 3145376, Patentee Hitachi, Ltd., pp. 1-23, Nov. 20, 2002.
Decision on Opposition No. 2001.72574 relating to JP 3147230, Patentee Hitachi, Ltd., pp. 1-22, Nov. 20, 2002.
R.P.H. Chang, “Multipurpose plasma reactor for materials research and processing”, J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 278-280.
Semiconductor Equipment Association of Japan, “Terminological Dictionary of Semiconductor Equipment”, front, table, p. 183, back, Nov. 20, 1987.
Semiconductor Equipment Association of Japan, “Semiconductor News”, vol. 4, pp. 38-43, Apr. 10, 1987 (w/translation).
JP patent No. 3145375, Notice of Reasons for Revocation Dec. 18, 2001 (TR).
JP patent No. 3147230, Notice of Reasons for Revocation Dec. 18, 2001 (TR).
KR application No. 46756/98, Preliminary Notice of Ground(s) for Rejection Jan. 20, 1999 (TR).
KR application No. 212874, Dec. 22, 2000, Notice of Decision on Opposition to the Granted Patent.
KR application No. 46757/98, Preliminary Notice of Ground(s) for Rejection Jan. 20, 1999 (TR).
KR application No. 212819, Dec. 22, 2000, Notice of Decision on Opposition to the Granted Patent (TR).
JP patent No. 3145359, Notice of Reasons for Revocation Dec. 18, 2001 (TR).
JP patent No. 3145375, Notice of Reasons for Revocation Dec. 18, 2001 (TR).
EP97111628, Office action Jun. 2001.
EP98106162, Office action Nov. 2000.
EP98106162, Office action Jun. 2001.
KR application No. 14984/91, Preliminary Notice of Ground(s) for Rejection (TR).
KR application No. 184682-00-00 Notice of Decision on Opposition to the Granted Patent Oct. 4, 2000 (TR).
KR application No. 184682, Trial Decision Aug. 1, 2000 (TR).
EP91307625, Summons to attend oral proceedings Dec. 9, 1999.
EP91307625, Communication of a notice of opposition Nov. 19, 1998.
EP91307625, Interlocutory decision in Opposition proceeding, May 16, 2000.
EP91307625, Minutes of the oral proceedings, Mar. 9, 2000.
EP97111628, Office action Dec. 1999.
EP97111628, Office action Nov. 2000.
JP application No. 11-001263, Notification of Reasons for Refusal Feb. 2, 2000 (TR).
JP application No. 2000-05449, Notification of Reasons for Refusal Sep. 6, 2000 (TR).
JP application No. 2000-054450, Notification of Reasons for Refusal Sep. 6, 2000 (TR).
JP application No. 2000-054451, Notification of Reasons for Refusal Sep. 6, 2000 (TR).
JP application No. 2000-054452, Notification of Reasons for Refusal Sep. 6, 2000 (TR).
EP91307625, Office Action Oct. 11, 1993.
JP patent No. 2816139, Notice of Reasons for Revocation Nov. 21,
Itou Atsushi
Kato Shigekazu
Nishihata Kouji
Tsubone Tsunehiko
Antonelli Terry Stout & Kraus LLP
Bennett Henry
Hitachi , Ltd.
O'Malley Kathryn S.
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