Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

1993-04-28

1994-04-26

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 156662, 4147445, B44C 122, H01L 21306, B66C 2300

Patent

active

053063805

ABSTRACT:
A vacuum processing apparatus for LCD substrates comprises three process chambers. Each of these process chambers is connected to a first load lock chamber via a gate. A second load lock chamber is connected to the first load lock chamber via another gate. A transfer member arranged under the air atmosphere is located to face the second load lock chamber. A retractable arm for transferring a substrate between each of the process chambers and the second load lock chamber is arranged within the first load lock chamber. Also arranged within the first load lock chamber is a storing member for temporarily storing the substrate. These storing member and the arm are supported by a rotatable base. The storing member has four different height levels for supporting the substrate, and is moved in a vertical direction.

REFERENCES:
patent: 4661196 (1987-04-01), Hockersmith et al.
patent: 4715921 (1987-12-01), Maher et al.
patent: 5138973 (1992-08-01), Davis et al.
patent: 5164034 (1992-11-01), Arai et al.

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