Vacuum processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With means for passing discrete workpiece through plural...

Reexamination Certificate

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Details

C156S345320, C118S719000, C204S298250, C204S298350

Reexamination Certificate

active

08048259

ABSTRACT:
A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A vacuum processing apparatus comprises a vacuum vessel in which a substrate-shaped sample is arranged in an internally arranged processing chamber in which the pressure is reduced; a transfer chamber to which the vacuum vessel is linked and through whose inside reduced in pressure the sample is transferred; a passage which establishes communication between the transfer chamber and the vacuum vessel in a state in which the transfer chamber and the processing chamber are linked to each other and through whose inside the sample not yet processed or already processed is transferred; and a covering member which is removably coupled to cover the internal wall face of the passage, wherein the sample is processed within the processing chamber with a plasma formed in the processing chamber.

REFERENCES:
patent: 2004/0069223 (2004-04-01), Tzeng et al.
patent: 2004/0083970 (2004-05-01), Imafuku et al.
patent: 8-172080 (1996-07-01), None
patent: 2001-77088 (2001-03-01), None
patent: 2002-520811 (2002-07-01), None
patent: WO 00/02228 (2000-01-01), None

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