Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

2007-07-24

2007-07-24

Moore, Karla (Department: 1763)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S733000, C156S345310, C156S345320, C414S939000

Reexamination Certificate

active

10812087

ABSTRACT:
A vacuum processing apparatus includes a vacuum processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas. The vacuum processing chamber has an axisymmetric structure, including a double wall structure, and a gate valve for sealing an opening through which the object enters the processing chamber.

REFERENCES:
patent: 5592581 (1997-01-01), Okase
patent: 5641375 (1997-06-01), Nitescu et al.
patent: 5884009 (1999-03-01), Okase
patent: 6192827 (2001-02-01), Welch et al.
patent: 6889627 (2005-05-01), Hao
patent: 65053532 (2003-03-01), None

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