Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

1997-02-21

1999-09-14

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

With treating means

134 11, 156345, 118724, C23C 1600

Patent

active

059517727

ABSTRACT:
A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the processing gas from the processing gas supply source into the vacuum processing chamber; and a pressure reducing valve for keeping the gas supply pipe at a lower pressure than the atmospheric pressure when the processing gas is to be supplied to the vacuum processing chamber.

REFERENCES:
patent: 4798166 (1989-01-01), Hirooka et al.
patent: 4987856 (1991-01-01), Hey et al.
patent: 5133284 (1992-07-01), Thomas et al.
patent: 5425842 (1995-06-01), Zijlstra
patent: 5505778 (1996-04-01), Ono et al.
patent: 5580822 (1996-12-01), Hayakawa et al.

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