Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

1994-06-07

1997-07-15

Tung, T.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

1566431, 1566461, 216 67, H01L 213065

Patent

active

056479450

ABSTRACT:
A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the processing gas from the processing gas supply source into the vacuum processing chamber; and a pressure reducing valve for keeping the gas supply pipe at a lower pressure than the atmospheric pressure when the processing gas is to be supplied to the vacuum processing chamber.

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Murphy et al, "Foundations of College Chemistry", 2d ed, 1975, month unavailable pp. 228-230.

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