Vacuum processing apparatus

Valves and valve actuation – With means to increase head and seat contact pressure – Gate valve

Reexamination Certificate

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Details

C251S329000, C414S277000

Reexamination Certificate

active

07322561

ABSTRACT:
The invention provides a highly reliable plasma processing apparatus having stable sealing performance. The vacuum processing apparatus comprises a vacuum vessel509having its inside decompressed, an opening1201disposed on a wall of the vacuum vessel for communicating the inside with the outside and through which a sample to be processed is taken in and out, a valve body1001disposed outside the wall for airtightly sealing or opening the opening1201, a seal member1002disposed on the side of the valve body that comes into contact with the wall surrounding the opening for sealing the inside of the opening by being in contact with the wall and the valve body1001when the valve body seals the opening1201, a first projection having a projected curved surface that comes into contact with the wall, and an overhang extending from this projection which is engaged with and attached to the inside of the valve body1001, which constitute the seal member, and a cover1003disposed on the side of the valve body1001that comes into contact with the wall for pressing at least a portion of the overhang onto the valve body and determining the position thereof.

REFERENCES:
patent: 2002255 (1935-05-01), Bevin
patent: 2114139 (1938-04-01), Crosthwait, Jr. et al.
patent: 2707378 (1955-05-01), Ryan
patent: 3884251 (1975-05-01), Knight
patent: 6460859 (2002-10-01), Hammi et al.
patent: 08-060374 (1996-03-01), None
patent: 2002-081555 (2002-03-01), None
patent: 2002-276825 (2002-09-01), None

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