Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

1993-07-28

1996-04-23

Johnstone, Adrienne C.

Material or article handling

Apparatus for moving material between zones having different...

For carrying standarized mechanical interface type

414416, 414936, 414937, 414939, B65G 4907, B65H 100, B65H 900

Patent

active

055097715

ABSTRACT:
A vacuum processing apparatus in which LCD substrates are processed includes three process chambers. Each of the process chambers is connected to a first load lock chamber through a gate valve. A second load lock chamber is also connected to the first load lock chamber through a gate valve. The second load lock chamber is opposed to a carrier member, which is arranged in the atmosphere, through a gate valve. A carrier arm is arranged in the first load lock chamber to carry the substrates between each of the process chambers and the second load lock chamber. A buffer rack for supporting two substrates thereon and positioners for aligning the two substrates, which are supported on the buffer rack, simultaneously are arranged in the second load lock chamber.

REFERENCES:
patent: 4412771 (1983-11-01), Gerlach et al.
patent: 4601627 (1986-07-01), Oka et al.
patent: 4892455 (1990-01-01), Hine
patent: 5215420 (1993-06-01), Hughes et al.
PCT document WO91/04213, Apr. 4, 1991, Wong et al.

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