Vacuum processing apparatus

Coating apparatus – Gas or vapor deposition – Work support

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Details

118 501, 118620, C23C 1600

Patent

active

051253607

ABSTRACT:
A vacuum processing apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber can be mechanically and easily controlled by adjusting the position of a susceptor in respect to an electrode body, and the susceptor and other components in the vacuum chamber can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber.

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