Vacuum processing and operating method using a vacuum chamber

Details Vacuum processing and operating method using a vacuum chamber Vacuum processing and operating method using a vacuum chamber

1999-09-07

2000-04-04

Gravini, Stephen

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

F26B 504

Patent

active

060445769

ABSTRACT:
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

REFERENCES:
patent: 3652444 (1972-03-01), Lester et al.
patent: 3981791 (1976-09-01), Rosvold
patent: 4138306 (1979-02-01), Niwa
patent: 4226897 (1980-10-01), Coleman
patent: 4311427 (1982-01-01), Coad et al.
patent: 4313783 (1982-02-01), Davies et al.
patent: 4313815 (1982-02-01), Graves, Jr. et al.
patent: 4318767 (1982-03-01), Hijikata et al.
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4457661 (1984-07-01), Flint et al.
patent: 4534314 (1985-08-01), Ackley
patent: 4563240 (1986-01-01), Shibata et al.
patent: 4576698 (1986-03-01), Gallagher et al.
patent: 4634331 (1987-01-01), Hertel
patent: 4643629 (1987-02-01), Takahashi et al.
patent: 4705951 (1987-11-01), Layman et al.
patent: 4715764 (1987-12-01), Hutchinson
patent: 4824309 (1989-04-01), Kakehi et al.
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4836905 (1989-06-01), Davis et al.
patent: 4851101 (1989-07-01), Hutchinson
patent: 4895107 (1990-01-01), Yano et al.
patent: 4902934 (1990-02-01), Miyamura et al.
patent: 4903937 (1990-02-01), Jakuniec et al.
patent: 4909695 (1990-03-01), Hurwitt et al.
patent: 4911597 (1990-03-01), Maydan et al.
patent: 4915564 (1990-04-01), Eror et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4924890 (1990-05-01), Giles et al.
patent: 4936329 (1990-06-01), Michael et al.
patent: 4951601 (1990-08-01), Maydan et al.
patent: 5007981 (1991-04-01), Kawasaki et al.
patent: 5014217 (1991-05-01), Savage
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5452166 (1995-09-01), Aylwin et al.
patent: 5462397 (1995-10-01), Iwabuchi
patent: 5504033 (1996-04-01), Bajor et al.
patent: 5504347 (1996-04-01), Jovanovic et al.
patent: 5509771 (1996-04-01), Hiroki
patent: 5556714 (1996-09-01), Fukuyama et al.
patent: 5651858 (1997-07-01), Lin
patent: 5675461 (1997-10-01), Aylwin et al.
patent: 5685684 (1997-11-01), Kato et al.
R.P.H. Chang, "Multipurpose plasma reactor for materials research and processing", J. Vac. Sci. Technol., vol. 14, No. 1, Jan./Feb. 1977, pp. 278-280.

Affiliated with

Also associated with

Rating

Vacuum processing and operating method using a vacuum chamber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum processing and operating method using a vacuum chamber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum processing and operating method using a vacuum chamber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-354214