Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-05-03
2005-05-03
Mills, Gregory (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S725000, C118S724000, C118S728000, C118S500000, C156S345290, C156S345510, C156S345520, C156S345530, C156S916000, C156S912000
Reexamination Certificate
active
06887315
ABSTRACT:
A vacuum plate for a fabricating apparatus of a semiconductor device, the vacuum plate includes: a first vacuum panel having a plurality of exhaust holes, the plurality of exhaust holes having same area and same distance from a center of the first vacuum panel, the plurality of exhaust holes being symmetrical and spaced apart from each other; and a second vacuum panel having a sidewall, a pumping hole and an air-load block, the sidewall being vertically protruded along an edge of the second vacuum panel, the air-load block being vertically protruded and symmetrical, a bottom surface of the first vacuum panel contacting a top surface of the sidewall and a top surface of the air-load block, thereby the first and second vacuum panels being combined.
REFERENCES:
patent: 6402848 (2002-06-01), Horiguchi et al.
patent: 62211914 (1987-09-01), None
Lee Seung-Hoon
Lim Yu-Dong
Park Hae-Jin
Duane Morris LLP
Jusung Engineering Co. Ltd.
Kackar Ram N.
Mills Gregory
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