Vacuum microelectronic device and methodology for fabricating sa

Details Vacuum microelectronic device and methodology for fabricating sa Vacuum microelectronic device and methodology for fabricating sa

1996-08-16

1999-07-06

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, H01J 902

Patent

active

059190701

ABSTRACT:
A vacuum state microelectronic device comprising at least a cathode, an anode, and a grid, disposed in a cavity, and formed by the wafer bonding of two planar substrates. The technology permits multiple vacuum state microelectronic devices (vacuum tubes) to be arrayed on a single substrate in an integrated manner.

REFERENCES:
patent: 3755027 (1973-08-01), Gilsing
patent: 4023876 (1977-05-01), Fukunaga et al.
patent: 4069436 (1978-01-01), Nakayama et al.
patent: 4182540 (1980-01-01), Frankland et al.
patent: 4307315 (1981-12-01), Meulemans et al.
patent: 4342142 (1982-08-01), Nieda et al.
patent: 4389277 (1983-06-01), De Vries
patent: 4398897 (1983-08-01), Nubani et al.
patent: 4449969 (1984-05-01), Eto et al.
patent: 4622675 (1986-11-01), Penn
patent: 4639804 (1987-01-01), Moribe et al.
patent: 4721885 (1988-01-01), Brodie
patent: 4978888 (1990-12-01), Anadan et al.
patent: 4990826 (1991-02-01), Cocks et al.
patent: 5079476 (1992-01-01), Kane
patent: 5150965 (1992-09-01), Fox
patent: 5163328 (1992-11-01), Holland et al.
patent: 5173634 (1992-12-01), Kane
patent: 5188977 (1993-02-01), Stengl et al.
patent: 5192240 (1993-03-01), Komatsu
patent: 5204581 (1993-04-01), Andreadakis et al.
patent: 5232389 (1993-08-01), Yamazaki et al.
patent: 5233262 (1993-08-01), Lynn et al.
patent: 5233263 (1993-08-01), Cronin et al.
patent: 5306904 (1994-04-01), Shimabukuro et al.
patent: 5438343 (1995-08-01), Khan et al.
patent: 5465024 (1995-11-01), Kane

Affiliated with

Also associated with

Rating

Vacuum microelectronic device and methodology for fabricating sa does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum microelectronic device and methodology for fabricating sa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum microelectronic device and methodology for fabricating sa will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-895035