Vacuum laminating process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

96 351, 156235, 156238, 156247, 156285, 156634, 156656, 156659, 156902, 427 96, C23F 102

Patent

active

041274369

ABSTRACT:
A process is described for applying, under vacuum, a photoresist-forming layer to a surface, such as a printed circuit board, whereby a laminate without entrapped air bubbles is obtained. The surface to which the photoresist-forming layer is applied has raised areas, such as circuit lines, which are completely enveloped by the layer.

REFERENCES:
patent: 3395014 (1968-07-01), Cohen et al.
patent: 3629036 (1971-12-01), Isaacson

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