Vacuum dryer and method of drying semiconductor device using the

Details Vacuum dryer and method of drying semiconductor device using the Vacuum dryer and method of drying semiconductor device using the

2000-01-28

2000-09-05

Gravini, Stephen

Drying and gas or vapor contact with solids

Process

With nondrying treating of material

34407, 134 254, F26B 700

Patent

active

061124303

ABSTRACT:
A vacuum dryer and a method of drying a semiconductor device using the same are provided. In the present invention, a vacuum dryer using isopropyl alcohol vapor, including an outer bath, an inner bath, a main water supply line, a supplementary water supply line, an inner bath drain line, and an outer bath drain line, is provided. After cleaning the inside of the vacuum dryer, the inner bath is filled with the supplied deionized water and the deionized water is continuously overflowed. Then, the semiconductor substrate is loaded into the inner bath of the vacuum dryer to which the deionized is continuously overflowed. The loaded semiconductor substrate is dried by supplying the isopropyl alcohol vapor to the inner bath into which the semiconductor substrate is loaded.

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