Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2003-07-17
2009-06-02
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
C414S939000
Reexamination Certificate
active
07541061
ABSTRACT:
A vacuum chamber used for processing articles, such as integrated circuit wafers, display panels, and the like, has a small load lock chamber formed at an opening in a wall of the chamber by a moveable article supporting surface within the chamber and a cover outside of the chamber. The supporting surface and cover are sealed to the chamber wall when urged against it. Articles placed into the load lock chamber, when the cover is opened, are moved into the vacuum chamber for processing by moving the supporting surface away from the wall after the cover has been closed and a vacuum established in the load lock chamber. Articles are removed from the vacuum chamber in a reverse manner. Various mechanisms are describe for moving the articles, including a particular robotic device that simultaneously swaps the positions of two articles between the supporting surface and a processing location within the vacuum chamber by first pulling the articles together and then rotating them in a half-circle. Integrated circuit wafers are preferably carried on a domed surface formed of wedge shaped pieces fit together on a frame, where the wedge shaped pieces and their wafers are individually removable from the frame for transfer to another frame at a different location.
REFERENCES:
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4341582 (1982-07-01), Kohman et al.
patent: 4584045 (1986-04-01), Richards
patent: 4632624 (1986-12-01), Mirkovich et al.
patent: 4676884 (1987-06-01), Dimock et al.
patent: 4861563 (1989-08-01), Shekerjian et al.
patent: 4915564 (1990-04-01), Eror et al.
patent: 5151008 (1992-09-01), Ishida et al.
patent: 5391035 (1995-02-01), Krueger
patent: 5586585 (1996-12-01), Bonora et al.
patent: 6429139 (2002-08-01), Ryan et al.
patent: 0 567 121 (1993-10-01), None
patent: 10303276 (1998-11-01), None
patent: 11-50253 (1999-02-01), None
patent: WO 99/35673 (1999-07-01), None
patent: WO 99/35673 (1999-07-01), None
patent: WO 99/48652 (1999-09-01), None
patent: WO 00/18980 (2000-04-01), None
H.K. Pulker, “Coatings on Glass,” Thin Films Science and Technology, 6, Elsevier Science B.V. (1984) pp. 207-213.
Utsunomiya Nobuaki; Patent Abstracts of Japan; abstract of JP 11050253, “Vacuum Treating Device,” Feb. 23, 1999; Shibaura Eng Works Co Ltd.
Watanabe Jun; Patent Abstracts of Japan; abstract of JP 11156771, “Substrate Conveying Device and Substrate Coveying Method,” Jun. 15, 1999; DaiNippon Screen Mfg Co Ltd.
European Search Report of Application No. EP 01 30 8428; Date of completion of the search: Feb. 21, 2006.
Utsunomiya Nobuaki, Patent Abstracts of Japan, Abstract of JP11-50253,“Vacuum Treating Device,” Feb. 23, 1999.
Partial European Search Report of Application No. EP 01 30 8428; Date of mailing: Jan. 2, 2006.
Edwards Vacuum, Inc.
Meeks Timothy
Nicholes Mary K.
Stouffer Kelly M
Zebrak Ira Lee
LandOfFree
Vacuum chamber load lock structure and article transport... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vacuum chamber load lock structure and article transport..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum chamber load lock structure and article transport... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4083999