Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Patent
1995-03-17
2000-10-17
Bowers, Charles
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
438785, 427542, 427558, H01L 2131
Patent
active
061330507
ABSTRACT:
A precursor solution formed of a liquid polyoxyalkylated metal complex in as solvent is applied to a substrate in the formation of a metal oxide thin film. The liquid thin film is baked in air to a temperature up to 500.degree. C. while UV radiation having a wavelength ranging from 180 nm to 300 nm is applied. The thin film can be twice-baked at increasing temperatures while UV radiation is applied at one or both bakings. The film is then annealed at temperature ranging from about 700.degree. C. to 850.degree. C. to produce a thin-film solid metal oxide product. Alternatively, the UV radiation may be applied to the liquid precursor, the thin film may be annealed with UV radiation, or combinations of such applications of UV radiation to the precursor, to the thin film before or after baking, and/or UV annealing may be used. The use of UV radiation significantly reduces the leakage current and carbon impurity content of the final metal oxide.
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Azuma Masamichi
McMillan Larry D.
Paz De Araujo Carlos A.
Scott Michael C.
Bowers Charles
Matsushita Electronics Corporation
Symetrix Corporation
Whipple Matthew
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