Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-09-20
1991-04-09
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430285, 430288, 430916, G03F 7029, G03C 168, G03C 171
Patent
active
050064363
ABSTRACT:
A UV curable, aqueous alkaline developable solder mask composition having tenting capabilities includes a thermal free radical initiator capable of generating free radicals with heat, and a polyunsaturated compound capable of being thermally cross-linked by the free radicals to provide a substantially fully cured solder mask coating.
REFERENCES:
patent: 4422914 (1983-12-01), Hung et al.
patent: 4458007 (1984-07-01), Geissler et al.
patent: 4587201 (1986-05-01), Morikawa et al.
patent: 4849320 (1989-07-01), Irving et al.
Hung Paul L. K.
Tseng Kenneth K. S.
Atochem North America, Inc.
Chu John S. Y.
Michl Paul R.
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