Utilizing saturated and unsaturated halocarbon gases in plasma e

Details Utilizing saturated and unsaturated halocarbon gases in plasma e Utilizing saturated and unsaturated halocarbon gases in plasma e

1978-03-21

1979-07-24

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 156662, 204192E, 252 791, C23F 100

Patent

active

041621859

ABSTRACT:
A method of plasma etching silica at a faster rate than silicon involves using a gaseous mixture containing an unsaturated halocarbon and a saturated halocarbon. The preferred halocarbon contains fluorine. A preferred embodiment is a gaseous mixture containing C.sub.3 F.sub.6 and C.sub.2 F.sub.6.

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