Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1999-04-07
2000-09-26
Smith, Matthew
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438601, 438597, 438598, H01L 2144
Patent
active
061241954
ABSTRACT:
The formation of routing traces on an external surface of a semiconductor device, such as a flip-chip, which has a plurality of ball or bump sites patterned in specific locations, wherein the ball or bumps sites are in electrical communication with external communication traces which are used to route signals from the flip-chip integrated circuitry. Such external communication traces generally result in unused space on the exterior surface of the flip-chip. This unused space can be utilized for forming routing traces to connect portions of the internal circuitry of the flip-chip rather than forming such routing traces internally, for forming routing traces to connect two or more semiconductor dice, or for forming routing traces for use as repair mechanisms.
REFERENCES:
patent: 3461357 (1969-08-01), Mutter et al.
patent: 3809625 (1974-05-01), Brown et al.
patent: 3881971 (1975-05-01), Greer et al.
patent: 4808552 (1989-02-01), Anderson
patent: 4988423 (1991-01-01), Yamamoto et al.
patent: 5106461 (1992-04-01), Volfson et al.
patent: 5130768 (1992-07-01), Wu et al.
patent: 5231590 (1993-07-01), Kumar et al.
patent: 5244837 (1993-09-01), Dennison
patent: 5341310 (1994-08-01), Gould et al.
patent: 5414637 (1995-05-01), Bertin et al.
patent: 5495397 (1996-02-01), Davidson et al.
patent: 5506172 (1996-04-01), Tang
patent: 5523253 (1996-06-01), Gilmour et al.
patent: 5523626 (1996-06-01), Hayashi et al.
patent: 5534465 (1996-07-01), Frye et al.
patent: 5570504 (1996-11-01), DiStefano et al.
patent: 5597470 (1997-01-01), Karavakis et al.
patent: 5619017 (1997-04-01), Distefano et al.
patent: 5632631 (1997-05-01), Fjelstad et al.
patent: 5640761 (1997-06-01), DiStefano et al.
patent: 5666007 (1997-09-01), Chung
patent: 5679609 (1997-10-01), Aimi et al.
patent: 5688721 (1997-11-01), Johnson
patent: 5751031 (1998-05-01), Thompson et al.
patent: 5904556 (1999-05-01), Suzuki et al.
Duesman Kevin G.
Farnworth Warren M.
Lee Granvill
Micro)n Technology, Inc.
Smith Matthew
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