Using ceramic wafer to protect susceptor during cleaning of a pr

Details Using ceramic wafer to protect susceptor during cleaning of a pr Using ceramic wafer to protect susceptor during cleaning of a pr

1996-03-13

1998-09-22

Smith, Lynette F.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 11, 134 13, 1566431, 1566561, 1566461, 1566571, 1566591, 156345, B08B 312, B08B 702, B44C 122, C03C 2506

Patent

active

058109374

ABSTRACT:
A method and apparatus for protecting a susceptor during a cleaning operation by loading a ceramic wafer onto the susceptor before introducing the cleaning agent into the chamber is provided. In particular, the ceramic wafer is chosen to have a dielectric value sufficient to alter the electromagnetic field of a plasma to spread the plasma away from the susceptor during a cleaning operation, directing more of the plasma towards the walls of the chamber.

REFERENCES:
patent: 4786352 (1988-11-01), Benzing
patent: 5024748 (1991-06-01), Fujimura
patent: 5041311 (1991-08-01), Tsukune et al.
patent: 5098245 (1992-03-01), Toro-Lira et al.
patent: 5240555 (1993-08-01), Kilburn
patent: 5269881 (1993-12-01), Sekiya et al.
patent: 5304248 (1994-04-01), Cheng et al.
patent: 5366585 (1994-11-01), Robertson et al.
patent: 5405491 (1995-04-01), Shahvandi et al.
patent: 5558717 (1996-09-01), Zhao et al.

Affiliated with

Also associated with

Rating

Using ceramic wafer to protect susceptor during cleaning of a pr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Using ceramic wafer to protect susceptor during cleaning of a pr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Using ceramic wafer to protect susceptor during cleaning of a pr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1619337