Using cell voltage as a monitor for deposition coverage

Details Using cell voltage as a monitor for deposition coverage Using cell voltage as a monitor for deposition coverage

2011-07-26

2011-07-26

Wilkins, III, Harry D (Department: 1723)

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C204S407000, C205S081000, C205S082000, C205S083000

Reexamination Certificate

active

07985328

ABSTRACT:
A method and apparatus are described that use cell voltage and/or current as monitor to prevent electrochemical deposition (e.g., electroplating) tools from deplating wafers with no or poor metal (e.g., Cu) seed coverage.

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