Using a partial metal level mask for early test results

Details Using a partial metal level mask for early test results Using a partial metal level mask for early test results

2006-09-19

2006-09-19

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

Reexamination Certificate

active

07111257

ABSTRACT:
A method of using special designed wiring level mask(s) to determine product transistor and circuit performance in a chip during the early portion of the product evaluation cycle saves weeks of time that would have been taken by the passage of the wafer through the fab. The method also saves cost during production by identifying wafers for rework at an early stage.

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